A SURFACE KINETIC-MODEL FOR PLASMA POLYMERIZATION WITH APPLICATION TO PLASMA-ETCHING

被引：35

作者：

BARIYA, AJ ^{[1
]}

FRANK, CW ^{[1
]}

MCVITTIE, JP ^{[1
]}

机构：

[1] STANFORD UNIV,CTR INTEGRATED SYST,STANFORD,CA 94305

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1990年 / 137卷 / 08期

关键词：

D O I：

10.1149/1.2086989

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Plasma polymerization in CHF3 glow discharges was investigated in a bell jar type RIE system. The rate of polymerization in Å/min, Rpt, was studied as a function of dc self-bias in the range −200 to −530V. It was found that at the lower values of dc self-bias, there was considerable enhancement in Rpt on the powered electrode compared to that on the grounded electrode. Rpt decreased monotonically on the powered, and increased monotonically on the grounded electrode as the dc self-bias increased. At the higher values of dc self-bias within our range of investigation, polymer formation was suppressed on the powered electrode, Rpteventually falling to zero. XPS analysis indicated a lower fluorine content for polymer deposited on the powered electrode. A model is proposed for the plasma polymerization mechanism and some of its implications investigated using Monte Carlo simulations. © 1990, The Electrochemical Society, Inc. All rights reserved.

引用

页码：2575 / 2581

页数：7

共 15 条

[1] A STUDY OF THE DEPOSITION OF POLYMERIC MATERIAL ONTO SURFACES FROM FLUOROCARBON RF PLASMAS [J].