FORMATION AND MICROSTRUCTURE OF VARIOUS THIN-FILM CHROMIUM SILICIDE PHASES

被引：7

作者：

BEDEKER, CJ

KRITZINGER, S

LOMBAARD, JC

机构：

来源：

THIN SOLID FILMS | 1986年 / 141卷 / 01期

关键词：

D O I：

10.1016/0040-6090(86)90325-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：117 / 127

页数：11

共 17 条

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[7] METALLURGICAL AND ELECTRICAL-PROPERTIES OF CHROMIUM SILICON INTERFACES [J].

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[8] FORMATION KINETICS OF CRSI2 FILMS ON SI SUBSTRATES WITH AND WITHOUT INTERPOSED PD2SI LAYER [J].

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