DEPOSITION OF STOICHIOMETRIC MOS2 THIN-FILMS BY PULSED LASER EVAPORATION

被引：36

作者：

DONLEY, MS ^{[1
]}

MCDEVITT, NT ^{[1
]}

HAAS, TW ^{[1
]}

MURRAY, PT ^{[1
]}

GRANT, JT ^{[1
]}

机构：

[1] UNIV DAYTON,RES INST,DAYTON,OH 45469

来源：

关键词：

D O I：

10.1016/0040-6090(89)90017-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：335 / 344

页数：10

共 27 条

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