共 19 条
DOSE AND ENERGY-DEPENDENCE OF INTERFACE TRAP FORMATION IN CO-60 AND X-RAY ENVIRONMENTS
被引:34
作者:

BENEDETTO, JM
论文数: 0 引用数: 0
h-index: 0

BOESCH, HE
论文数: 0 引用数: 0
h-index: 0

MCLEAN, FB
论文数: 0 引用数: 0
h-index: 0
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关键词:
D O I:
10.1109/23.25449
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
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页码:1260 / 1264
页数:5
相关论文
共 19 条
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- [5] DEFECT PRODUCTION IN SIO2 BY X-RAY AND CO-60 RADIATIONS[J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1985, 32 (06) : 4363 - 4368DOZIER, CM论文数: 0 引用数: 0 h-index: 0BROWN, DB论文数: 0 引用数: 0 h-index: 0THROCKMORTON, JL论文数: 0 引用数: 0 h-index: 0MA, DI论文数: 0 引用数: 0 h-index: 0
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- [7] AN EVALUATION OF LOW-ENERGY X-RAY AND CO-60 IRRADIATIONS OF MOS-TRANSISTORS[J]. IEEE TRANSACTIONS ON NUCLEAR SCIENCE, 1987, 34 (06) : 1535 - 1539DOZIER, CM论文数: 0 引用数: 0 h-index: 0机构: SANDIA NATL LABS,ALBUQUERQUE,NM 87185 SANDIA NATL LABS,ALBUQUERQUE,NM 87185FLEETWOOD, DM论文数: 0 引用数: 0 h-index: 0机构: SANDIA NATL LABS,ALBUQUERQUE,NM 87185 SANDIA NATL LABS,ALBUQUERQUE,NM 87185BROWN, DB论文数: 0 引用数: 0 h-index: 0机构: SANDIA NATL LABS,ALBUQUERQUE,NM 87185 SANDIA NATL LABS,ALBUQUERQUE,NM 87185WINOKUR, PS论文数: 0 引用数: 0 h-index: 0机构: SANDIA NATL LABS,ALBUQUERQUE,NM 87185 SANDIA NATL LABS,ALBUQUERQUE,NM 87185
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