PRODUCTION OF LARGE-DIAMETER MICROWAVE PLASMA USING AN ANNULAR SLOT ANTENNA

被引：17

作者：

IKUSHIMA, T

OKUNO, Y

FUJITA, H

机构：

[1] Department of Electrical Engineering, Saga University, Saga 840

来源：

APPLIED PHYSICS LETTERS | 1994年 / 64卷 / 01期

关键词：

D O I：

10.1063/1.110905

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A new production method for a large diameter microwave plasma is proposed without magnetic coils. An annular slot antenna and two ring-typed permanent magnets are used for the generation of high density plasma in the circumference of a chamber with the plasma confinement and diffusing to the central region. The optimum arrangement of components in the device is examined for the production of the large diameter uniform plasma. The almost uniform electron density of about 4x10(10) cm-3 is realized, and the plasma with two electron temperatures is observed. The measurement with a directional ion energy analyzer reveals that ions are almost isotropic.

引用

页码：25 / 27

页数：3

共 17 条

[1] MULTICUSP TYPE ELECTRON-CYCLOTRON RESONANCE ION-SOURCE FOR PLASMA PROCESSING [J].

AMEMIYA, H ;

ISHII, S ;

SHIGUEOKA, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (02) :376-384

[2] ELECTRON-CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN-FILM DEPOSITION [J].

ASMUSSEN, J .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03) :883-893

[3]

Chen F F, 1965, PLASMA DIAGNOSTIC TE

[4] SPATIAL CONTROL OF ELECTRON-ENERGY DISTRIBUTION FUNCTION IN A MAGNETICALLY FILTERED MULTICUSP PLASMA SOURCE [J].

FUKUMASA, O ;

NAITOU, H ;

SAKIYAMA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1991, 30 (6A) :L1063-L1065

[5] 30-CM ELECTRON-CYCLOTRON PLASMA GENERATOR [J].

GOEDE, H .

JOURNAL OF SPACECRAFT AND ROCKETS, 1987, 24 (05) :437-443

[6] PERFORMANCE OF ELECTRON CYCROTRON RESONANCE PLASMA PRODUCED BY A NEW MICROWAVE LAUNCHING SYSTEM IN A MULTICUSP MAGNETIC-FIELD WITH PERMANENT-MAGNETS [J].

HATTA, A ;

KUBO, M ;

YASAKA, Y ;

ITATANI, R .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (5A) :1473-1479

[7] 8'' UNIFORM ELECTRON-CYCLOTRON RESONANCE PLASMA SOURCE USING A CIRCULAR TE01 MODE MICROWAVE [J].

HIDAKA, R ;

YAMAGUCHI, T ;

HIROTSU, N ;

OHSHIMA, T ;

KOGA, R ;

TANAKA, M ;

KAWAI, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (1A) :174-178

[8]

IIZUKA S, 1992, 9TH P S PLASM PROC, P327

[9] LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION METHOD UTILIZING AN ELECTRON-CYCLOTRON RESONANCE PLASMA [J].

MATSUO, S ;

KIUCHI, M .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04) :L210-L212

[10] MICROWAVE PLASMA - ITS CHARACTERISTICS AND APPLICATIONS IN THIN-FILM TECHNOLOGY [J].

MUSIL, J .

VACUUM, 1986, 36 (1-3) :161-169

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