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MICROWAVE PLASMA - ITS CHARACTERISTICS AND APPLICATIONS IN THIN-FILM TECHNOLOGY

被引：50
作者：
MUSIL, J
机构：
[1] Czechoslovak Acad of Sciences, Prague, Czech, Czechoslovak Acad of Sciences, Prague, Czech
来源：
VACUUM | 1986年 / 36卷 / 1-3期
关键词：
D O I：
10.1016/0042-207X(86)90292-7
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
51
引用
收藏
页码：161 / 169
页数：9
相关论文
共 51 条
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  • [2] EXPLANATION OF PLASMA DENSITIES HIGH ABOVE CRITICAL DENSITY IN A CYLINDER EXCITED BY AN RF HELIX
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  • [6] METHOD OF FORMATION OF THIN OXIDE-FILMS ON SILICON IN A MICROWAVE MAGNETOACTIVE OXYGEN PLASMA
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    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1975, 8 (16) : L195 - L197
  • [7] BARDOS L, 1983, ROZPRAVY CSAV, V93, P3
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    [J]. JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS, 1973, 6 (07): : 628 - 630
  • [9] LARGE-DIAMETER PLASMA COLUMNS PRODUCED BY SURFACE-WAVES AT RADIO AND MICROWAVE-FREQUENCIES
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    [J]. JOURNAL OF APPLIED PHYSICS, 1985, 57 (01) : 91 - 95
  • [10] COMPOSITIONAL CHARACTERIZATION OF MICROWAVE PLASMA A-SI-H FILMS
    CURRIE, JF
    DEPELSENAIRE, P
    HUOT, JP
    PAQUIN, L
    WERTHEIMER, MR
    YELON, A
    BRASSARD, C
    LECUYER, J
    GROLEAU, R
    MARTIN, JP
    [J]. CANADIAN JOURNAL OF PHYSICS, 1983, 61 (04) : 582 - 590
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