OPTICAL-PROPERTIES OF CU FILMS DEPOSITED USING ION ASSISTED DEPOSITION

被引：8

作者：

ALJUMAILY, GA

WILSON, SR

DEHAINAUT, LL

MCNALLY, JJ

MCNEIL, JR

机构：

[1] UNIV NEW MEXICO,ALBUQUERQUE,NM 87131

[2] USAF ACAD,DEPT PHYS,COLORADO SPRINGS,CO 80840

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期

关键词：

D O I：

10.1116/1.574486

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1909 / 1910

页数：2

共 6 条

[1] EFFECT OF ION ASSISTED DEPOSITION ON OPTICAL SCATTER AND SURFACE MICROSTRUCTURE OF THIN-FILMS [J].

ALJUMAILY, GA ;

MCNALLY, JJ ;

MCNEIL, JR ;

HERRMANN, WC .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03) :651-655

[2] INFLUENCE OF METAL-FILMS ON THE OPTICAL SCATTER AND RELATED MICROSTRUCTURE OF COATED SURFACES [J].

ALJUMAILY, GA ;

WILSON, SR ;

MCNALLY, JJ ;

MCNEIL, JR ;

BENNETT, JM ;

HURT, HH .

APPLIED OPTICS, 1986, 25 (20) :3631-3634

[3] ION-BEAM-ASSISTED DEPOSITION OF THIN-FILMS [J].

MARTIN, PJ ;

MACLEOD, HA ;

NETTERFIELD, RP ;

PACEY, CG ;

SAINTY, WG .

APPLIED OPTICS, 1983, 22 (01) :178-184

[4] SURFACE SMOOTHING EFFECTS OF THIN-FILM DEPOSITION [J].

MCNEIL, JR ;

WEI, LJ ;

ALJUMAILY, GA ;

SHAKIR, S ;

MCIVER, JK .

APPLIED OPTICS, 1985, 24 (04) :480-485

[5] ION-ASSISTED DEPOSITION OF OPTICAL THIN-FILMS - LOW-ENERGY VS HIGH-ENERGY BOMBARDMENT [J].

MCNEIL, JR ;

BARRON, AC ;

WILSON, SR ;

HERRMANN, WC .

APPLIED OPTICS, 1984, 23 (04) :552-559

[6] PROPERTIES OF TIO2 AND SIO2 THIN-FILMS DEPOSITED USING ION ASSISTED DEPOSITION [J].

MCNEIL, JR ;

ALJUMAILY, GA ;

JUNGLING, KC ;

BARRON, AC .

APPLIED OPTICS, 1985, 24 (04) :486-489

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