POLYMER MATERIALS FOR MICROLITHOGRAPHY

[91] NATE K, 1984, ELECTROCHEM SOC EXT, V84, P530

[92] Neureuther A. R., 1985, Microcircuit Engineering 84. International Conference Proceedings, P53

[93] Novembre A. E., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P14, DOI 10.1117/12.963620

[94] OPTIMAL DEVELOPER SELECTION FOR NEGATIVE ACTING RESISTS [J]. POLYMER ENGINEERING AND SCIENCE, 1986, 26 (16) : 1158 - 1164

[95] OTOOLE MM, 1981, P SOC PHOTO-OPT INST, V275, P128, DOI 10.1117/12.931883

[96] PHOTO-CHEMICAL DECOMPOSITION MECHANISMS FOR AZ-TYPE PHOTORESISTS [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1979, 23 (01) : 42 - 55

[97] POL V, 1986, P SOC PHOTO-OPT INS, V633, P6

[98] Ranby B., 1975, PHOTODEGRADATION PHO, P156

[99] SPIN-ON GLASS AS AN INTERMEDIATE LAYER IN A TRI-LAYER RESIST PROCESS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (09) : 2152 - 2154

[100] REICHMANIS E, 1987, ACS SYM SER, V346, P110

[91] NATE K, 1984, ELECTROCHEM SOC EXT, V84, P530

[92] Neureuther A. R., 1985, Microcircuit Engineering 84. International Conference Proceedings, P53

[93] Novembre A. E., 1986, Proceedings of the SPIE - The International Society for Optical Engineering, V631, P14, DOI 10.1117/12.963620

[94] OPTIMAL DEVELOPER SELECTION FOR NEGATIVE ACTING RESISTS [J]. POLYMER ENGINEERING AND SCIENCE, 1986, 26 (16) : 1158 - 1164

[95] OTOOLE MM, 1981, P SOC PHOTO-OPT INST, V275, P128, DOI 10.1117/12.931883

[96] PHOTO-CHEMICAL DECOMPOSITION MECHANISMS FOR AZ-TYPE PHOTORESISTS [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1979, 23 (01) : 42 - 55

[97] POL V, 1986, P SOC PHOTO-OPT INS, V633, P6

[98] Ranby B., 1975, PHOTODEGRADATION PHO, P156

[99] SPIN-ON GLASS AS AN INTERMEDIATE LAYER IN A TRI-LAYER RESIST PROCESS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (09) : 2152 - 2154

[100] REICHMANIS E, 1987, ACS SYM SER, V346, P110