PROPERTIES OF SPUTTERED MOLYBDENUM SILICIDE THIN-FILMS

[1] CAPPELLETTI P, 1981, SEMICONDUCTOR SILICO, P608

[2] REFRACTORY MOSI2 AND MOSI2 POLYSILICON BULK CMOS CIRCUITS [J]. ELECTRON DEVICE LETTERS, 1982, 3 (02): : 37 - 40

[3] SIZE EFFECTS IN MOSI2-GATE MOSFETS [J]. APPLIED PHYSICS LETTERS, 1980, 36 (04) : 297 - 299

[4] CHOW TP, 1982, THESIS RENSSELAER PO, P35

[5] CHOW TP, 1982, EL SOC EXT ABSTR MAY, V82

[6] COMPOSITE SILICIDE GATE ELECTRODES - INTERCONNECTIONS FOR VLSI DEVICE TECHNOLOGIES [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (08) : 1417 - 1424

[7] PHOSPHORUS-DOPED MOLYBDENUM SILICIDE FILMS FOR LSI APPLICATIONS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (11) : 2402 - 2410

[8] NEW MOS PROCESS USING MOSI2 AS A GATE MATERIAL [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1978, 17 : 37 - 42

[9] FILM PROPERTIES OF MOSI2 AND THEIR APPLICATION TO SELF-ALIGNED MOSI2 GATE MOSFET [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (08) : 1431 - 1435

[10] COSPUTTERED MOLYBDENUM SILICIDES ON THERMAL SIO2 [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) : 5380 - 5385

[1] CAPPELLETTI P, 1981, SEMICONDUCTOR SILICO, P608

[2] REFRACTORY MOSI2 AND MOSI2 POLYSILICON BULK CMOS CIRCUITS [J]. ELECTRON DEVICE LETTERS, 1982, 3 (02): : 37 - 40

[3] SIZE EFFECTS IN MOSI2-GATE MOSFETS [J]. APPLIED PHYSICS LETTERS, 1980, 36 (04) : 297 - 299

[4] CHOW TP, 1982, THESIS RENSSELAER PO, P35

[5] CHOW TP, 1982, EL SOC EXT ABSTR MAY, V82

[6] COMPOSITE SILICIDE GATE ELECTRODES - INTERCONNECTIONS FOR VLSI DEVICE TECHNOLOGIES [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (08) : 1417 - 1424

[7] PHOSPHORUS-DOPED MOLYBDENUM SILICIDE FILMS FOR LSI APPLICATIONS [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (11) : 2402 - 2410

[8] NEW MOS PROCESS USING MOSI2 AS A GATE MATERIAL [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1978, 17 : 37 - 42

[9] FILM PROPERTIES OF MOSI2 AND THEIR APPLICATION TO SELF-ALIGNED MOSI2 GATE MOSFET [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1980, 27 (08) : 1431 - 1435

[10] COSPUTTERED MOLYBDENUM SILICIDES ON THERMAL SIO2 [J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (10) : 5380 - 5385