APPLICATION OF THIN SILICON FILMS TO CLOSED-TUBE SI AND ZN DIFFUSION IN GAAS AND ALXGA1-XAS

被引：7

作者：

VAWTER, GA

OMURA, E

WU, XS

MERZ, JL

COLDREN, L

HU, E

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 11期

关键词：

D O I：

10.1063/1.340331

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：5541 / 5547

页数：7

共 23 条

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