DEPOSITION TECHNIQUES AND APPLICATIONS OF AMORPHOUS-SILICON FILMS

[71] VOGETGROTE U, 1976, STRUCTURE EXCITATION, P91

[72] Vossen J.L., 1978, THIN FILM PROCESSES

[73] Vossen J. L., 1978, THIN FILM PROCESSES

[74] INHIBITION OF CHEMICAL SPUTTERING OF ORGANICS AND C BY TRACE AMOUNTS OF CU SURFACE CONTAMINATION [J]. JOURNAL OF APPLIED PHYSICS, 1976, 47 (02) : 544 - 546

[75] Wagner J. J., 1982, PLASMA CHEM PLASMA P, V2, P95, DOI DOI 10.1007/BF00566860

[76] REACTIVITY OF SOLID SILICON WITH HYDROGEN UNDER CONDITIONS OF A LOW-PRESSURE PLASMA [J]. CHEMICAL PHYSICS LETTERS, 1979, 62 (01) : 173 - 177

[77] PHOTOELECTRIC PROPERTIES OF GD A-SI-H MONOLAYER FILMS FOR ELECTROPHOTOGRAPHIC APPLICATIONS [J]. JOURNAL DE PHYSIQUE, 1981, 42 (NC4): : 495 - 498

[78] ELECTROPHOTOGRAPHIC PROPERTIES OF RF GLOW DISCHARGE-PRODUCED AMORPHOUS SI-H FILM [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (01) : 305 - 310

[79] YAMAMOTO N, 1981, 9TH P INT C AM LIQ S

[80] 1980, PHYSICS TODAY MAY, P26

[71] VOGETGROTE U, 1976, STRUCTURE EXCITATION, P91

[72] Vossen J.L., 1978, THIN FILM PROCESSES

[73] Vossen J. L., 1978, THIN FILM PROCESSES

[74] INHIBITION OF CHEMICAL SPUTTERING OF ORGANICS AND C BY TRACE AMOUNTS OF CU SURFACE CONTAMINATION [J]. JOURNAL OF APPLIED PHYSICS, 1976, 47 (02) : 544 - 546

[75] Wagner J. J., 1982, PLASMA CHEM PLASMA P, V2, P95, DOI DOI 10.1007/BF00566860

[76] REACTIVITY OF SOLID SILICON WITH HYDROGEN UNDER CONDITIONS OF A LOW-PRESSURE PLASMA [J]. CHEMICAL PHYSICS LETTERS, 1979, 62 (01) : 173 - 177

[77] PHOTOELECTRIC PROPERTIES OF GD A-SI-H MONOLAYER FILMS FOR ELECTROPHOTOGRAPHIC APPLICATIONS [J]. JOURNAL DE PHYSIQUE, 1981, 42 (NC4): : 495 - 498

[78] ELECTROPHOTOGRAPHIC PROPERTIES OF RF GLOW DISCHARGE-PRODUCED AMORPHOUS SI-H FILM [J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (01) : 305 - 310

[79] YAMAMOTO N, 1981, 9TH P INT C AM LIQ S

[80] 1980, PHYSICS TODAY MAY, P26