NITROGEN-RELATED DEEP ELECTRON TRAPS IN FLOAT ZONE SILICON

被引:12
作者
NAUKA, K [1 ]
GOORSKY, MS [1 ]
GATOS, HC [1 ]
LAGOWSKI, J [1 ]
机构
[1] MIT,CAMBRIDGE,MA 02139
关键词
D O I
10.1063/1.96274
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:1341 / 1343
页数:3
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共 9 条
[1]  
ABE T, ELECTROCHEM SOC P, V81, P54
[2]   CAPACITANCE TRANSIENT SPECTROSCOPY OF TRACE CONTAMINATION IN SILICON [J].
BENTON, JL ;
KIMERLING, LC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (09) :2098-2102
[3]   DEEP-LEVEL NITROGEN CENTERS IN LASER-ANNEALED ION-IMPLANTED SILICON [J].
BROWER, KL .
PHYSICAL REVIEW B, 1982, 26 (11) :6040-6052
[4]   JAHN-TELLER-DISTORTED NITROGEN DONOR IN LASER-ANNEALED SILICON [J].
BROWER, KL .
PHYSICAL REVIEW LETTERS, 1980, 44 (24) :1627-1629
[5]  
NAUKA K, 1985, MATER RES SOC S P, V36, P175
[6]   THERMAL ANNEALING OF SI-N ABSORPTION-BANDS IN NITROGEN-IMPLANTED SILICON [J].
STEIN, HJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (03) :668-671
[7]   PHOTO-LUMINESCENCE ASSOCIATED WITH NITROGEN IN SILICON [J].
TAJIMA, M ;
MASUI, T ;
ABE, T ;
NOZAKI, T .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1981, 20 (06) :L423-L425
[8]  
TAKUMARU Y, 1982, JPN J APPL PHYS, V21, pL443
[9]   CONCENTRATION, SOLUBILITY, AND EQUILIBRIUM DISTRIBUTION COEFFICIENT OF NITROGEN AND OXYGEN IN SEMICONDUCTOR SILICON [J].
YATSURUGI, Y ;
AKIYAMA, N ;
ENDO, Y ;
NOZAKI, T .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (07) :975-979