QUANTITATIVE-EVALUATION OF AES DEPTH PROFILES OF THIN ANODIC OXIDE-FILMS (TA2O5 TA, NB2O5 NB)

被引：72

作者：

SANZ, JM ^{[1
]}

HOFMANN, S ^{[1
]}

机构：

[1] MAX PLANCK INST METALLFORSCH,INST WERKSTOFFWISSENSCH,D-7000 STUTTGART 1,FED REP GER

来源：

SURFACE AND INTERFACE ANALYSIS | 1983年 / 5卷 / 05期

关键词：

D O I：

10.1002/sia.740050507

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：210 / 216

页数：7

共 34 条

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[8]

Hofmann S., 1980, Surface and Interface Analysis, V2, P148, DOI 10.1002/sia.740020406

[9] DEPTH RESOLUTION IN SPUTTER PROFILING [J].

HOFMANN, S .

APPLIED PHYSICS, 1977, 13 (02) :205-207

[10]

Hofmann S., 1983, MIKROCHIM ACTA S, V10, P135

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