METALLURGICAL STRUCTURE OF BE-AU AND SI-AU OHMIC CONTACTS TO GAP

被引：6

作者：

BRANTLEY, WA ^{[1
]}

KERAMIDAS, VG ^{[1
]}

SCHWARTZ, B ^{[1
]}

READ, MH ^{[1
]}

PETROFF, PM ^{[1
]}

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 10期

关键词：

D O I：

10.1149/1.2132643

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1582 / 1584

页数：3

共 12 条

[1] GALLIUM MIGRATION THROUGH CONTACT METALLIZATIONS ON GAP [J].

BRANTLEY, WA ;

SCHWARTZ, B ;

KERAMIDAS, VG ;

KAMMLOTT, GW ;

SINHA, AK .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1975, 122 (03) :434-435

[2]

Chopra K.L, 1969, THIN FILM PHENOMENA

[3] EQUILIBRIUM DIAGRAM OF SYSTEM GOLD-GALLIUM [J].

COOKE, CJ ;

HUMEROTH.W .

JOURNAL OF THE LESS-COMMON METALS, 1966, 10 (01) :42-&

[4]

HANSEN M, 1958, CONSTITUTION BINARY, P187

[5]

HIRSCH PB, 1965, ELECTRON MICROS, pCH6

[6] MEASUREMENT OF STRAINS AT SI-SIO2 INTERFACE [J].

JACCODINE, RJ ;

SCHLEGEL, WA .

JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) :2429-+

[7]

Maissel L.I., 1970, HDB THIN FILM TECHNO

[8] DETAILED LIGHT-CURRENT-VOLTAGE ANALYSIS OF GAP ELECTROLUMINESCENT DIODES [J].

RALSTON, JM .

JOURNAL OF APPLIED PHYSICS, 1973, 44 (06) :2635-2641

[9] X-RAY ANALYSIS OF SPUTTERED FILMS OF BETA-TANTALUM AND BODY-CENTERED CUBIC TANTALUM [J].

READ, MH ;

HENSLER, DH .

THIN SOLID FILMS, 1972, 10 (01) :123-&

[10] X-RAY DETERMINATION OF STRESSES IN THIN-FILMS AND SUBSTRATES BY AUTOMATIC BRAGG ANGLE CONTROL [J].

ROZGONYI, GA ;

CIESIELK.TJ .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1973, 44 (08) :1053-1057

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