EFFECT OF ORIENTATION ON THE SCHOTTKY-BARRIER HEIGHT OF THERMODYNAMICALLY STABLE EPITAXIAL METAL GAAS STRUCTURES

被引:38
作者
PALMSTROM, CJ [1 ]
CHEEKS, TL [1 ]
GILCHRIST, HL [1 ]
ZHU, JG [1 ]
CARTER, CB [1 ]
WILKENS, BJ [1 ]
MARTIN, R [1 ]
机构
[1] CORNELL UNIV,ITHACA,NY 14853
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1992年 / 10卷 / 04期
关键词
D O I
10.1116/1.578120
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The use of thermodynamically stable epitaxial metal/GaAs contacts fabricated by molecular-beam epitaxy has enabled detailed studies of Schottky barrier formation on well characterized and controlled structures. The effects of lattice mismatch, annealing and substrate orientation on the barrier height of Sc1-xErxAs semimetal contacts on n-GaAs are studied. The barrier height could be varied from approximately 1.03 eV for Sc1-xErxAs films grown at 350-degrees-C and annealed at approximately 600-degrees-C on (100) GaAs to approximately 0.63 eV for films grown at approximately 600-degrees-C on (111BAR) GaAs.
引用
收藏
页码:1946 / 1952
页数:7
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