HISTORICAL-PERSPECTIVE OF ORIENTED AND EPITAXIAL THIN-FILMS

被引：2

作者：

FRANCOMBE, MH

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1994年 / 12卷 / 04期

关键词：

D O I：

10.1116/1.579070

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Over the years, vacuum techniques for both oriented and epitaxial film growth, and also for device processing, have played a critical role in the evolution of advanced solid-state components. The American Vacuum Society, through its symposia and publishing activities, has contributed greatly to this progress. The history of organizational and technical factors that have impacted on these developments is summarized, and selected examples of unique epitaxial metallic, semiconductor and ferroelectric device structures are discussed.

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页码：928 / 935

页数：8

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