IN SITU CHANNELING ANALYSIS DURING THERMAL ANNEALING OF HE-4+-IMPLANTED LINBO3

被引:7
作者
BARFOOT, KM
LAURSEN, T
WHITTON, JL
WEISS, BL
WEBB, RP
机构
[1] QUEENS UNIV,DEPT PHYS,KINGSTON K7L 3N6,ONTARIO,CANADA
[2] UNIV SURREY,DEPT ELECTR & ELECT ENGN,GUILDFORD GU2 5XH,SURREY,ENGLAND
关键词
D O I
10.1016/0168-583X(89)90419-9
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:141 / 145
页数:5
相关论文
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