OBSERVATIONS ON PHOSPHORUS STABILIZED SIO2 FILMS

被引:23
作者
YAMIN, M
机构
关键词
D O I
10.1109/T-ED.1966.15677
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:256 / +
页数:1
相关论文
共 13 条
[1]  
CANINA VG, 1962, PHYS CHEM GLASSES-B, V3, P43
[2]  
DUNN T, 1965, PHYS CHEM GLASSES, V6, P16
[3]  
FRANZ I, 1964, TELEFUNKENZEITUNG, V37, P194
[4]  
HETHERINGTON G, 1965, PHYS CHEM GLASSES, V6, P6
[5]   RECTIFYING ACTION AND ELECTROMOTIVE FORCES OF FILMS OF TA205 AND SI02 AT HIGH TEMPERATURES [J].
ISHIKAWA, Y ;
SASAKI, Y ;
SEKI, Y ;
INOWAKI, S .
JOURNAL OF APPLIED PHYSICS, 1963, 34 (04) :867-&
[6]   EFFECT OF AN ELECTRIC FIELD ON SILICON OXIDATION [J].
JORGENSEN .
JOURNAL OF CHEMICAL PHYSICS, 1962, 37 (04) :874-&
[7]   STABILIZATION OF SIO2 PASSIVATION LAYERS WITH P2O5 [J].
KERR, DR ;
LOGAN, JS ;
BURKHARDT, PJ ;
PLISKIN, WA .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1964, 8 (04) :376-&
[8]   ELECTROCHEMICAL PHENOMENA IN THIN FILMS OF SILICON DIOXIDE ON SILICON [J].
SERAPHIM, DP ;
BRENNEMANN, AE ;
FRIEDMAN, HL ;
DHEURLE, FM .
IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1964, 8 (04) :400-+
[9]   ION TRANSPORT PHENOMENA IN INSULATING FILMS [J].
SNOW, EH ;
GROVE, AS ;
DEAL, BE ;
SAH, CT .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (05) :1664-&
[10]   DIFFUSION OF OXYGEN IN VITREOUS SILICA [J].
SUCOV, EW .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1963, 46 (01) :14-20