TEMPERATURE-DEPENDENCE OF FET PROPERTIES FOR CR-DOPED AND LEC SEMI-INSULATING GAAS SUBSTRATES

被引:11
作者
HICKMOTT, TW
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D O I
10.1109/T-ED.1984.21473
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:54 / 62
页数:9
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共 36 条
[11]   MAGNETOTRANSCONDUCTANCE MOBILITY MEASUREMENTS OF GAAS-MESFETS [J].
JAY, PR ;
WALLIS, RH .
ELECTRON DEVICE LETTERS, 1981, 2 (10) :265-267
[12]   THE ROLE OF DEEP-LEVEL CENTERS AND COMPENSATION IN PRODUCING SEMI-INSULATING GAAS [J].
JOHNSON, EJ ;
KAFALAS, JA ;
DAVIES, RW .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (01) :204-207
[13]   REDISTRIBUTION OF CR IN CAPLESS-ANNEALED GAAS UNDER ARSENIC PRESSURE [J].
KASAHARA, J ;
WATANABE, N .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (03) :L151-L154
[14]  
KOCOT C, 1982, IEEE T ELECTRON DEV, V29, P1059
[15]   ORIGIN OF THE 0.82-EV ELECTRON TRAP IN GAAS AND ITS ANNIHILATION BY SHALLOW DONORS [J].
LAGOWSKI, J ;
GATOS, HC ;
PARSEY, JM ;
WADA, K ;
KAMINSKA, M ;
WALUKIEWICZ, W .
APPLIED PHYSICS LETTERS, 1982, 40 (04) :342-344
[16]   C-V ANALYSIS OF A PARTIALLY DEPLETED SEMICONDUCTING CHANNEL [J].
LEHOVEC, K .
APPLIED PHYSICS LETTERS, 1975, 26 (03) :82-84
[17]  
LEHOVEC K, 1975, I PHYS C SER, V24, P292
[18]   DEFECT FORMATION CHEMISTRY OF EL2 CENTER AT EC-0.83 EV IN ION-IMPLANTED GALLIUM-ARSENIDE [J].
LI, GP ;
WANG, KL .
JOURNAL OF APPLIED PHYSICS, 1982, 53 (12) :8653-8662
[19]   SI-28 IMPLANTATION INTO AR-40 IMPLANT-PRETREATED SEMI-INSULATING GAAS SUBSTRATES - MOBILITY AND ACTIVATION EFFICIENCY ENHANCEMENT [J].
LIU, SG ;
NARAYAN, SY ;
MAGEE, CW ;
WU, CP .
APPLIED PHYSICS LETTERS, 1982, 41 (01) :72-75
[20]  
MARACAS GN, 1981, 8TH P BIANN CORN ENG, P149