A RE-EXAMINATION OF PRACTICAL PERFORMANCE LIMITS OF SCALED N-CHANNEL AND P-CHANNEL MOS DEVICES FOR VLSI

被引:27
作者
SHICHIJO, H
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D O I
10.1016/0038-1101(83)90072-2
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TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:969 / 986
页数:18
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共 33 条
[1]   MODELS FOR COMPUTER-SIMULATION OF COMPLETE IC FABRICATION PROCESS [J].
ANTONIADIS, DA ;
DUTTON, RW .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) :490-500
[2]   SHORT-CHANNEL MOSFETS IN THE PUNCHTHROUGH CURRENT MODE [J].
BARNES, JJ ;
SHIMOHIGASHI, K ;
DUTTON, RW .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) :446-453
[3]   MODELS FOR CONTACTS TO PLANAR DEVICES [J].
BERGER, HH .
SOLID-STATE ELECTRONICS, 1972, 15 (02) :145-&
[4]  
BLAIR JC, UNPUB
[5]   GENERALIZED GUIDE FOR MOSFET MINIATURIZATION [J].
BREWS, JR ;
FICHTNER, W ;
NICOLLIAN, EH ;
SZE, SM .
ELECTRON DEVICE LETTERS, 1980, 1 (01) :2-4
[6]  
Chatterjee P. K., 1980, International Electron Devices Meeting. Technical Digest, P28
[7]  
Chatterjee P. K., 1980, IEEE Electron Device Letters, VEDL-1, P220, DOI 10.1109/EDL.1980.25295
[8]   VELOCITY OF SURFACE CARRIERS IN INVERSION-LAYERS ON SILICON [J].
COEN, RW ;
MULLER, RS .
SOLID-STATE ELECTRONICS, 1980, 23 (01) :35-40
[9]  
DEMOULIN E, 1979, IEDM, P34
[10]  
Dennard R. H., 1972, IEDM, P168