SURFACE STATE DENSITY EVALUATION USING HIGH-FREQUENCY MOS CAPACITANCE TECHNIQUE

被引：16

作者：

KATTO, H ^{[1
]}

ITOH, Y ^{[1
]}

机构：

[1] HITACHI LTD,CENT RES LAB,KOKUBUNJI,TOKYO,JAPAN

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1974年 / 21卷 / 02期

关键词：

D O I：

10.1002/pssa.2210210228

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：627 / 637

页数：11

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