INTRINSIC STRESS IN AIN PREPARED BY DUAL-ION-BEAM SPUTTERING

[41] LOW-TEMPERATURE GROWTH OF PIEZOELECTRIC AIN FILM BY RF REACTIVE PLANAR MAGNETRON SPUTTERING [J]. APPLIED PHYSICS LETTERS, 1980, 36 (08) : 643 - 645

[42] THEORY OF SPUTTERING .I. SPUTTERING YIELD OF AMORPHOUS AND POLYCRYSTALLINE TARGETS [J]. PHYSICAL REVIEW, 1969, 184 (02): : 383 - +

[43] IR AND X-RAY STUDIES OF ION-BEAM-SYNTHESIZED ALUMINUM NITRIDE FILMS [J]. THIN SOLID FILMS, 1986, 138 (01) : 79 - 86

[44] ORIGIN OF INTERNAL STRESS IN LOW-VOLTAGE SPUTTERED TUNGSTEN FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (01) : 112 - 117

[45] REACTION OF N2-(+) BEAMS WITH ALUMINUM SURFACES [J]. JOURNAL OF CHEMICAL PHYSICS, 1981, 75 (04) : 1735 - 1745

[46] INTERNAL-STRESSES IN TITANIUM, NICKEL, MOLYBDENUM, AND TANTALUM FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 164 - 168

[47] INTERNAL-STRESSES IN METALLIC-FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING [J]. THIN SOLID FILMS, 1979, 64 (01) : 111 - 119

[48] INTERNAL-STRESSES IN AMORPHOUS-SILICON FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING USING NE, AR, KR, XE, AND AR+H2 [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 203 - 207

[49] TSU R, 1976, 3RD P INT S LIGHT SC, P393

[50] WANG JS, 1981, 1981 IEEE P ULTR S, P502

[41] LOW-TEMPERATURE GROWTH OF PIEZOELECTRIC AIN FILM BY RF REACTIVE PLANAR MAGNETRON SPUTTERING [J]. APPLIED PHYSICS LETTERS, 1980, 36 (08) : 643 - 645

[42] THEORY OF SPUTTERING .I. SPUTTERING YIELD OF AMORPHOUS AND POLYCRYSTALLINE TARGETS [J]. PHYSICAL REVIEW, 1969, 184 (02): : 383 - +

[43] IR AND X-RAY STUDIES OF ION-BEAM-SYNTHESIZED ALUMINUM NITRIDE FILMS [J]. THIN SOLID FILMS, 1986, 138 (01) : 79 - 86

[44] ORIGIN OF INTERNAL STRESS IN LOW-VOLTAGE SPUTTERED TUNGSTEN FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (01) : 112 - 117

[45] REACTION OF N2-(+) BEAMS WITH ALUMINUM SURFACES [J]. JOURNAL OF CHEMICAL PHYSICS, 1981, 75 (04) : 1735 - 1745

[46] INTERNAL-STRESSES IN TITANIUM, NICKEL, MOLYBDENUM, AND TANTALUM FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 164 - 168

[47] INTERNAL-STRESSES IN METALLIC-FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING [J]. THIN SOLID FILMS, 1979, 64 (01) : 111 - 119

[48] INTERNAL-STRESSES IN AMORPHOUS-SILICON FILMS DEPOSITED BY CYLINDRICAL MAGNETRON SPUTTERING USING NE, AR, KR, XE, AND AR+H2 [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02): : 203 - 207

[49] TSU R, 1976, 3RD P INT S LIGHT SC, P393

[50] WANG JS, 1981, 1981 IEEE P ULTR S, P502