ATOM-PROBE STUDY OF THE EARLY STAGE OF SILICIDE FORMATION .2. NI-SI SYSTEM

被引：24

作者：

NISHIKAWA, O

NOMURA, E

WADA, M

TSUNASHIMA, Y

HORIE, S

SHIBATA, M

YOSHIMURA, T

UEMORI, R

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1983年 / 1卷 / 01期

关键词：

D O I：

10.1116/1.582533

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：10 / 14

页数：5

共 13 条

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[2]

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[9] ATOM-PROBE STUDY OF THE EARLY STAGE OF SILICIDE FORMATION .1. W-SI SYSTEM [J].

NISHIKAWA, O ;

TSUNASHIMA, Y ;

NOMURA, E ;

HORIE, S ;

WADA, M ;

SHIBATA, M ;

YOSHIMURA, T ;

UEMORI, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (01) :6-9

[10] REVIEW OF BINARY ALLOY FORMATION BY THIN-FILM INTERACTIONS [J].

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