LOW-ENERGY SCANNING ELECTRON-MICROSCOPY COMBINED WITH LOW-ENERGY ELECTRON-DIFFRACTION

被引：31

作者：

ICHINOKAWA, T ^{[1
]}

ISHIKAWA, Y ^{[1
]}

KEMMOCHI, M ^{[1
]}

IKEDA, N ^{[1
]}

HOSOKAWA, Y ^{[1
]}

KIRSCHNER, J ^{[1
]}

机构：

[1] FORSCHUNGSZENTRUM JULICH, INST GRENZFLACHENFORSCH & VAKUUMPHYS, D-5170 JULICH 1, FED REP GER

来源：

SURFACE SCIENCE | 1986年 / 176卷 / 1-2期

关键词：

D O I：

10.1016/0039-6028(86)90184-6

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

收藏

页码：397 / 414

页数：18

相关论文

共 21 条

[1] SURFACE PROCESSES IN GROWTH SILICON ON (111)SILICON IN ULTRAHIGH VACUUM
ABBINK, HC
BROUDY, RM
MCCARTHY, GP
[J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (10) : 4673 - &
[2] INVESTIGATION OF ULTRA-THIN AG FILMS ON NI WITH THE PHOTOELECTRON EMISSION MICROSCOPE
BETHGE, H
KRAJEWSKI, T
LICHTENBERGER, O
[J]. ULTRAMICROSCOPY, 1985, 17 (01) : 21 - 30
[3] BUTLER JW, 1969, 6TH P INT C EL MICR, V1, P191
[4] PROSPECTS IN HIGH-RESOLUTION X-RAY PHOTOELECTRON MICROSCOPY
CAZAUX, J
[J]. ULTRAMICROSCOPY, 1985, 17 (01) : 43 - 49
[5] STEM IMAGING AND ANALYSIS OF SURFACES
COWLEY, JM
KANG, ZC
[J]. ULTRAMICROSCOPY, 1983, 11 (2-3) : 131 - 140
[6] ELECTRON GUN USING A FIELD EMISSION SOURCE
CREWE, AV
EGGENBER.DN
WALL, J
WELTER, LM
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1968, 39 (04) : 576 - &
[7] SELECTED AREA LOW-ENERGY ELECTRON-DIFFRACTION AND MICROSCOPY
DELONG, A
KOLARIK, V
[J]. ULTRAMICROSCOPY, 1985, 17 (01) : 67 - 72
[8] GUITTARD C, 1977, J PHYS D, V10, P2331
[9] REFLECTION ELECTRON-MICROSCOPY (REM) OF VICINAL SURFACES OF FCC METALS
HSU, T
[J]. ULTRAMICROSCOPY, 1983, 11 (2-3) : 167 - 172
[10] HULTGREN R, 1973, SELECTED VALUES THER, P317