THE EFFECT OF WALL HEATING IN HORIZONTAL ORGANOMETALLIC VAPOR-PHASE EPITAXIAL REACTORS

被引:6
作者
CHINOY, PB
KAMINSKI, DA
GHANDHI, SK
机构
[1] RENSSELAER POLYTECH INST,DEPT MECH ENGN AERONAUT ENGN & MECH,TROY,NY 12180
[2] RENSSELAER POLYTECH INST,DEPT ELECT COMP & SYST ENGN,TROY,NY 12180
关键词
D O I
10.1149/1.2085805
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Numerical solutions of the conservation of mass, momentum, and energy equations in a horizontal organometallic vapor phase epitaxial reactor have been obtained for different temperature boundary conditions. The idealized case of isothermal reactor walls was compared to the physically realistic case of a wall which interacts radiatively and convectively with its surroundings. The thermal radiation analysis includes a two-band model for the nongray, semitransparent, quartz walls of the reactor. The radiation analysis is coupled with convection to (or from) the gas on the inside and to the ambient on the outside of the reactor. Wall heating is shown to have a substantial effect on the velocity and temperature fields in the reactor. The simulated temperature fields show a close match with experimental results. The temperature distribution along the wall for the radiation case was compared with the isothermal case. Finally, the effect on growth rate along the susceptor was studied.
引用
收藏
页码:1452 / 1455
页数:4
相关论文
共 26 条
[1]   TRANSMISSIVITY AND ABSORPTION OF FUSED QUARTZ BETWEEN 0.22MU AND 3.5MU FROM ROOM TEMPERATURE TO 1500 DEGREES C [J].
BEDER, EC ;
BASS, CD ;
SHACKLEF.WL .
APPLIED OPTICS, 1971, 10 (10) :2263-&
[2]   AN EXPERIMENTAL AND THEORETICAL-STUDY OF GROWTH IN HORIZONTAL EPITAXIAL REACTORS [J].
CHINOY, PB ;
AGNELLO, PD ;
GHANDHI, SK .
JOURNAL OF ELECTRONIC MATERIALS, 1988, 17 (06) :493-499
[3]  
CHINOY PB, 1991, J NUM HEAT TRANSFE A, V19, P73
[4]   A MATHEMATICAL-MODEL OF THE COUPLED FLUID-MECHANICS AND CHEMICAL-KINETICS IN A CHEMICAL VAPOR-DEPOSITION REACTOR [J].
COLTRIN, ME ;
KEE, RJ ;
MILLER, JA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (02) :425-434
[5]   SPECTRAL EMISSIVITY AND ABSORPTION-COEFFICIENT OF SILICA GLASS AT EXTREMELY HIGH-TEMPERATURES IN THE SEMITRANSPARENT REGION [J].
DVURECHENSKY, AV ;
PETROV, VA ;
REZNIK, VY .
INFRARED PHYSICS, 1979, 19 (3-4) :465-469
[6]   EFFECTS OF BOUNDARY-CONDITIONS ON THE FLOW AND HEAT-TRANSFER IN A ROTATING-DISK CHEMICAL VAPOR-DEPOSITION REACTOR [J].
EVANS, G ;
GREIF, R .
NUMERICAL HEAT TRANSFER, 1987, 12 (02) :243-252
[7]   A NUMERICAL-MODEL OF THE FLOW AND HEAT-TRANSFER IN A ROTATING-DISK CHEMICAL VAPOR-DEPOSITION REACTOR [J].
EVANS, G ;
GREIF, R .
JOURNAL OF HEAT TRANSFER-TRANSACTIONS OF THE ASME, 1987, 109 (04) :928-935
[9]   TRANSMITTANCE OF OPTICAL MATERIALS AT HIGH TEMPERATURES IN 1-MU TO 12-MU RANGE [J].
GILLESPI.DT ;
OLSEN, AL ;
NICHOLS, LW .
APPLIED OPTICS, 1965, 4 (11) :1488-&
[10]  
HE Y, 1987, 10TH P C CVD, P193