FABRICATION OF A GAAS-ALGAAS GRIN-SCH SQW LASER DIODE ON SILICON BY EPITAXIAL LIFT-OFF

被引:32
作者
POLLENTIER, I
BUYDENS, L
VANDAELE, P
DEMEESTER, P
机构
[1] Laboratory of Electromagnetism and Acoustics, University of Gent-IMEC, B-9000, Gent
关键词
D O I
10.1109/68.76859
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Epitaxial lift-off (ELO) is becoming an attractive means for the optoelectronic integration of III-V semiconductors with Si for applications such as optical communication and optical printing. This paper describes the epitaxial lift-off of a GaAs-AIGaAs graded-index separate-confinement heterostructure (GRIN-SCH) single-quantum-well (SQW) laser diode and the subsequent transfer to a Si substrate. It is the first time that a layer structure containing AI0.60Ga0.40As has been lifted off, and that the 5 mu-m thin film was cleaved after ELO by a novel wedge-cleaving process. These results hold interesting prospects towards the ability to integrate III-V short-cavity lasers on arbitrary substrates.
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页码:115 / 117
页数:3
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