LANGMUIR PROBE MEASUREMENTS ON CHF3 AND CF4 PLASMAS - THE ROLE OF IONS IN THE REACTIVE SPUTTER ETCHING OF SIO2 AND SI

被引：75

作者：

STEINBRUCHEL, C

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 03期

关键词：

D O I：

10.1149/1.2119774

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：648 / 655

页数：8

共 41 条

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