REACTIONS OF THIN-FILM TITANIUM ON SILICON STUDIED BY RAMAN-SPECTROSCOPY

被引：34

作者：

NEMANICH, RJ

FULKS, RT

STAFFORD, BL

VANDERPLAS, HA

机构：

来源：

APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 07期

关键词：

D O I：

10.1063/1.95524

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：670 / 672

页数：3

共 7 条

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NIPOTI, R ;

GUERRI, S .

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[2] THERMODYNAMIC CONSIDERATIONS IN REFRACTORY METAL-SILICON-OXYGEN SYSTEMS [J].

BEYERS, R .

JOURNAL OF APPLIED PHYSICS, 1984, 56 (01) :147-152

[3] SOLID-STATE REACTIONS IN TITANIUM THIN-FILMS ON SILICON [J].

KATO, H ;

NAKAMURA, Y .

THIN SOLID FILMS, 1976, 34 (01) :135-138

[4] THIN-FILM INTERACTION BETWEEN TITANIUM AND POLYCRYSTALLINE SILICON [J].

MURARKA, SP ;

FRASER, DB .

JOURNAL OF APPLIED PHYSICS, 1980, 51 (01) :342-349

[5]

Nemanich R.J., 1983, MRS ONLINE P LIBR, V25, P9, DOI [10.1557/PROC-25-9, DOI 10.1557/PROC-25-9]

[6] INTERFERENCE-ENHANCED RAMAN-SCATTERING OF VERY THIN TITANIUM AND TITANIUM-OXIDE FILMS [J].

NEMANICH, RJ ;

TSAI, CC ;

CONNELL, GAN .

PHYSICAL REVIEW LETTERS, 1980, 44 (04) :273-276

[7]

1983, MATER RES SOC S P, V25

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