SILICIDE FORMATION CORRELATED WITH SURFACE RESISTIVITY MEASUREMENTS

被引：13

作者：

PETERSSON, S ^{[1
]}

MGBENU, E ^{[1
]}

TOVE, PA ^{[1
]}

机构：

[1] UNIV UPPSALA,INST TECHNOL,DEPT ELECTR,UPPSALA,SWEDEN

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1976年 / 36卷 / 01期

关键词：

D O I：

10.1002/pssa.2210360123

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：217 / 225

页数：9

共 10 条

[1]

BRAGG WH, 1905, PHILOS MAG, V10, P5318

[2] IMPLANTED NOBLE-GAS ATOMS AS DIFFUSION MARKERS IN SILICIDE FORMATION [J].

CHU, WK ;

LAU, SS ;

MAYER, JW ;

MULLER, H .

THIN SOLID FILMS, 1975, 25 (02) :393-402

[3] ANALYSIS OF THIN-FILM STRUCTURES WITH NUCLEAR BACKSCATTERING AND X-RAY-DIFFRACTION [J].

MAYER, JW ;

TU, KN .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01) :86-93

[4] ANALYSIS OF AMORPHOUS LAYERS ON SILICON BY BACKSCATTERING AND CHANNELING EFFECT MEASUREMENTS [J].

MEYER, O ;

GYULAI, J ;

MAYER, JW .

SURFACE SCIENCE, 1970, 22 (02) :263-&

[5] SOLID-SOLID REACTIONS IN PT-SI SYSTEMS [J].

MUTA, H ;

SHINODA, D .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (06) :2913-+

[6] KINETICS AND MECHANISM OF PLATINUM SILICIDE FORMATION ON SILICON [J].

POATE, JM ;

TISONE, TC .

APPLIED PHYSICS LETTERS, 1974, 24 (08) :391-393

[7]

SAMSONOV GV, 1959, SILITSIDY ISPOLZOVAN

[8] THERMAL-STABILITY OF THIN PTSI FILMS ON SILICON SUBSTRATES [J].

SINHA, AK ;

SHENG, TT ;

MARCUS, RB ;

HASZKO, SE .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (09) :3637-+

[9] MEASUREMENT OF SHEET RESISTIVITIES WITH THE 4-POINT PROBE [J].

SMITS, FM .

BELL SYSTEM TECHNICAL JOURNAL, 1958, 37 (03) :711-718

[10]

Ziegler J. F., 1974, Atomic Data and Nuclear Data Tables, V13, P463, DOI 10.1016/0092-640X(74)90009-6

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