COMPOSITION AND ELECTRON STRESS EFFECTS IN SILICON-NITRIDE THIN-FILMS MADE BY THERMAL GROWTH AND CHEMICAL ETCHING OF LPCVD MNOS STRUCTURES AS STUDIED BY X-RAY PHOTO-ELECTRON SPECTROSCOPY (XPS)

被引：6

作者：

WURZBACH, JA

GRUNTHANER, FJ

MASERJIAN, J

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1982年 / 20卷 / 04期

关键词：

D O I：

10.1116/1.571653

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：962 / 965

页数：4

共 12 条

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