NEAR EQUILIBRIUM GROWTH OF SILICON BY CVD .2. THE SI-I-H SYSTEM

被引：2

作者：

HANSSEN, JHL

SAAMAN, AA

DEMOOR, HHC

GILING, LJ

BLOEM, J

机构：

来源：

JOURNAL OF CRYSTAL GROWTH | 1983年 / 65卷 / 1-3期

关键词：

D O I：

10.1016/0022-0248(83)90081-7

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：406 / 410

页数：5

共 14 条

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