QUANTITATIVE AES DEPTH PROFILING OF VERY THIN OVERLAYERS

被引：48

作者：

SANZ, JM ^{[1
]}

HOFMANN, S ^{[1
]}

机构：

[1] MAX PLANCK INST MET RES,INST WERKSTOFFWISSENSCH,D-7000 STUTTGART 80,FED REP GER

来源：

关键词：

D O I：

10.1002/sia.740080403

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：147 / 157

页数：11

共 32 条

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