QUANTITATIVE AES DEPTH PROFILING OF VERY THIN OVERLAYERS

[21] AES SPUTTER PROFILING AND ANGLE RESOLVED XPS OF INSITU GROWN VERY THIN TANTALUM-OXIDE FILMS [J]. SURFACE AND INTERFACE ANALYSIS, 1984, 6 (02) : 82 - 89

[22] QUANTITATIVE INTERPRETATION OF AUGER SPUTTER PROFILES OF THIN-LAYERS [J]. APPLIED SURFACE SCIENCE, 1981, 9 (1-4) : 131 - 140

[23] PASSIVE STATE OF STAINLESS-STEELS [J]. MATERIALS SCIENCE AND ENGINEERING, 1980, 42 (1-2): : 161 - 171

[24] DECONVOLUTION METHODS APPLIED TO SPUTTER DEPTH PROFILES AT INTERFACES [J]. THIN SOLID FILMS, 1983, 105 (01) : 25 - 32

[25] AUGER-ELECTRON SPECTROSCOPY AND X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES OF THE OXIDATION OF POLYCRYSTALLINE TANTALUM AND NIOBIUM AT ROOM-TEMPERATURE AND LOW OXYGEN PRESSURES [J]. JOURNAL OF THE LESS-COMMON METALS, 1983, 92 (02): : 317 - 327

[26] QUANTITATIVE-EVALUATION OF AES DEPTH PROFILES OF THIN ANODIC OXIDE-FILMS (TA2O5 TA, NB2O5 NB) [J]. SURFACE AND INTERFACE ANALYSIS, 1983, 5 (05) : 210 - 216

[27] Seah M. P., 1979, Surface and Interface Analysis, V1, P2, DOI 10.1002/sia.740010103

[28] THE DEPTH DEPENDENCE OF THE DEPTH RESOLUTION IN COMPOSITION DEPTH PROFILING WITH AUGER-ELECTRON SPECTROSCOPY [J]. SURFACE AND INTERFACE ANALYSIS, 1983, 5 (01) : 33 - 37

[29] THE STATISTICAL SPUTTERING CONTRIBUTION TO RESOLUTION IN CONCENTRATION-DEPTH PROFILES [J]. THIN SOLID FILMS, 1981, 81 (03) : 239 - 246

[30] SEO M, 1980, T JAP I MET, V21, P205

[21] AES SPUTTER PROFILING AND ANGLE RESOLVED XPS OF INSITU GROWN VERY THIN TANTALUM-OXIDE FILMS [J]. SURFACE AND INTERFACE ANALYSIS, 1984, 6 (02) : 82 - 89

[22] QUANTITATIVE INTERPRETATION OF AUGER SPUTTER PROFILES OF THIN-LAYERS [J]. APPLIED SURFACE SCIENCE, 1981, 9 (1-4) : 131 - 140

[23] PASSIVE STATE OF STAINLESS-STEELS [J]. MATERIALS SCIENCE AND ENGINEERING, 1980, 42 (1-2): : 161 - 171

[24] DECONVOLUTION METHODS APPLIED TO SPUTTER DEPTH PROFILES AT INTERFACES [J]. THIN SOLID FILMS, 1983, 105 (01) : 25 - 32

[25] AUGER-ELECTRON SPECTROSCOPY AND X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES OF THE OXIDATION OF POLYCRYSTALLINE TANTALUM AND NIOBIUM AT ROOM-TEMPERATURE AND LOW OXYGEN PRESSURES [J]. JOURNAL OF THE LESS-COMMON METALS, 1983, 92 (02): : 317 - 327

[26] QUANTITATIVE-EVALUATION OF AES DEPTH PROFILES OF THIN ANODIC OXIDE-FILMS (TA2O5 TA, NB2O5 NB) [J]. SURFACE AND INTERFACE ANALYSIS, 1983, 5 (05) : 210 - 216

[27] Seah M. P., 1979, Surface and Interface Analysis, V1, P2, DOI 10.1002/sia.740010103

[28] THE DEPTH DEPENDENCE OF THE DEPTH RESOLUTION IN COMPOSITION DEPTH PROFILING WITH AUGER-ELECTRON SPECTROSCOPY [J]. SURFACE AND INTERFACE ANALYSIS, 1983, 5 (01) : 33 - 37

[29] THE STATISTICAL SPUTTERING CONTRIBUTION TO RESOLUTION IN CONCENTRATION-DEPTH PROFILES [J]. THIN SOLID FILMS, 1981, 81 (03) : 239 - 246

[30] SEO M, 1980, T JAP I MET, V21, P205