FORMATION OF ULTRATHIN TUNGSTEN FILAMENTS VIA SELECTIVE LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION

被引：5

作者：

BUSTA, HH ^{[1
]}

FEINERMAN, AD ^{[1
]}

KETTERSON, JB ^{[1
]}

WONG, GK ^{[1
]}

机构：

[1] NORTHWESTERN UNIV,DEPT PHYS & ASTRON,EVANSTON,IL 60621

来源：

JOURNAL OF APPLIED PHYSICS | 1985年 / 58卷 / 02期

关键词：

D O I：

10.1063/1.336146

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：987 / 989

页数：3

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