THE PREPARATION OF INAS1-XSBX ALLOYS AND STRAINED-LAYER SUPERLATTICES BY MOCVD

被引:29
作者
BIEFELD, RM
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关键词
D O I
10.1016/0022-0248(86)90329-5
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
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页码:392 / 399
页数:8
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共 24 条
[1]  
BIEFELD RM, 1983, J ELECTRON MATER, V12, P903, DOI 10.1007/BF02655302
[3]   PREPARATION OF III-V COMPOUND SEMICONDUCTORS BY METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION [J].
BIEFELD, RM .
INDUSTRIAL & ENGINEERING CHEMISTRY PRODUCT RESEARCH AND DEVELOPMENT, 1982, 21 (04) :525-528
[4]  
BIEFELD RM, UNPUB J ELECTRON MAT
[5]  
BIEFELD RM, 1985, J CRYST GROWTH, V75, P255
[6]   GAAS1-XSBX GROWTH BY OMVPE [J].
CHERNG, MJ ;
COHEN, RM ;
STRINGFELLOW, GB .
JOURNAL OF ELECTRONIC MATERIALS, 1984, 13 (05) :799-813
[7]   GROWTH OF INSB AND INAS1-XSBX BY OM-CVD [J].
CHIANG, PK ;
BEDAIR, SM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (10) :2422-2426
[8]   ORGANOMETALLIC VPE GROWTH OF INAS1-XSBX ON INAS [J].
FUKUI, T ;
HORIKOSHI, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (01) :L53-L56
[9]  
HARRISON BC, 1962, INORGAN CHEM, V1
[10]   FRACTURE OF BRITTLE EPITAXIAL FILMS UNDER INFLUENCE OF MISFIT STRESS [J].
MATTHEWS, JW ;
KLOKHOLM, E .
MATERIALS RESEARCH BULLETIN, 1972, 7 (03) :213-&