STRAIN-ASSISTED P-TYPE DOPING OF II-VI SEMICONDUCTORS

被引:10
作者
REN, SY [1 ]
DOW, JD [1 ]
KLEMM, S [1 ]
机构
[1] UNIV SCI & TECHNOL CHINA, HEFEI, PEOPLES R CHINA
关键词
D O I
10.1063/1.344297
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:2065 / 2068
页数:4
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