OPTIMIZATION OF DEPOSITION PARAMETERS IN ION-ASSISTED DEPOSITION OF OPTICAL THIN-FILMS

被引：14

作者：

MARTIN, PJ

NETTERFIELD, RP

机构：

[1] CSIRO Division of Applied Physics, Sydney

来源：

THIN SOLID FILMS | 1991年 / 199卷 / 02期

关键词：

D O I：

10.1016/0040-6090(91)90017-R

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A method is described in which the optimum deposition conditions for ion-assisted deposition of optical thin films can be rapidly established. The method is based on the use of real-time ellipsometry and examples are given for 600 eV oxygen-ion-assisted deposition of Y2O3, Ta2O5 and HfO2. The maximum refractive indices for these materials at 633 nm were found to be 1.92, 2.16 and 2.11 respectively which are close to the reported values for bulk materials.

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页码：351 / 358

页数：8

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