A VERTICAL STEPPER FOR SYNCHROTRON X-RAY-LITHOGRAPHY

被引：33

作者：

ISHIHARA, S

KANAI, M

UNE, A

SUZUKI, M

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584508

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1652 / 1656

页数：5

共 11 条

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Kobayashi T., 1988, International Electron Devices Meeting. Technical Digest (IEEE Cat. No.88CH2528-8), P881, DOI 10.1109/IEDM.1988.32951

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[7] THE IMPACT OF HIGH-SENSITIVITY RESIST MATERIALS ON X-RAY-LITHOGRAPHY [J].

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[9] FABRICATION OF FULLY SCALED 0.5-MU-M N-TYPE METAL-OXIDE SEMICONDUCTOR TEST DEVICES USING SYNCHROTRON X-RAY-LITHOGRAPHY - OVERLAY, RESIST PROCESSES, AND DEVICE FABRICATION [J].

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[10] REPLICATED RESIST PATTERN RESOLUTION WITH SYNCHROTRON ORBITAL RADIATION [J].

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