PROCESS-CONTROL WITH OPTICAL-EMISSION SPECTROSCOPY IN TRIODE ION PLATING

被引：18

作者：

SALMENOJA, K

KORHONEN, AS

SULONEN, MS

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1985年 / 3卷 / 06期

关键词：

D O I：

10.1116/1.572882

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2364 / 2367

页数：4

共 10 条

[1] RANGES OF SOME LIGHT-IONS MEASURED BY (P, GAMMA) RESONANCE BROADENING [J].

ANTTILA, A ;

BISTER, M ;

FONTELL, A ;

WINTERBON, KB .

RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1977, 33 (01) :13-19

[2] THE ANALYSIS AND AUTOMATIC-CONTROL OF A REACTIVE DC MAGNETRON SPUTTERING PROCESS [J].

ENJOUJI, K ;

MURATA, K ;

NISHIKAWA, S .

THIN SOLID FILMS, 1983, 108 (01) :1-7

[3] OPTICAL SPECTROSCOPY FOR DIAGNOSTICS AND PROCESS-CONTROL DURING GLOW-DISCHARGE ETCHING AND SPUTTER DEPOSITION [J].

GREENE, JE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (05) :1718-1729

[4] OPTICAL SPECTROSCOPY FOR GLOW-DISCHARGE SPUTTERING DIAGNOSTICS AND PROCESS-CONTROL [J].

GREENE, JE .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (02) :203-204

[5] STUDY OF OPTICAL EMISSION FROM AN RF PLASMA DURING SEMICONDUCTOR ETCHING [J].

HARSHBARGER, WR ;

PORTER, RA ;

MILLER, TA ;

NORTON, P .

APPLIED SPECTROSCOPY, 1977, 31 (03) :201-207

[6]

Hashimoto K., 1983, Proceedings of the International Ion Engineering Congress. The 7th Symposium (1983 International) on Ion Sources and Ion Assisted Technology (ISIAT '83) and the 4th International Conference on Ion and Plasma Assisted Techniques (IPAT '83), P1125

[7] AN OPTICAL-EMISSION STUDY OF THE GLOW-DISCHARGE DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FROM ARGON-SILANE MIXTURES [J].

KAMPAS, FJ .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) :2276-2280

[8] PLASMA NITRIDING AND ION PLATING WITH AN INTENSIFIED GLOW-DISCHARGE [J].

KORHONEN, AS ;

SIRVIO, EH ;

SULONEN, MS .

THIN SOLID FILMS, 1983, 107 (04) :387-394

[9]

LEMPERIERE G, 1984, THIN SOLID FILMS, V111, P39

[10]

SALMENOJA K, 1984, 6TH INT C THIN FILMS

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