FLUORINE-ENHANCED THERMAL-OXIDATION OF SILICON IN THE PRESENCE OF NF3

被引：45

作者：

MORITA, M

KUBO, T

ISHIHARA, T

HIROSE, M

机构：

来源：

APPLIED PHYSICS LETTERS | 1984年 / 45卷 / 12期

关键词：

D O I：

10.1063/1.95131

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1312 / 1314

页数：3

共 10 条

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[8] HARTREE-SLATER SUBSHELL PHOTOIONIZATION CROSS-SECTIONS AT 1254 AND 1487EV [J].

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[10]

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