ELECTRONIC-PROPERTIES OF A-SI-H AND A-SI-F FILMS PRODUCED BY ION-IMPLANTATION

被引:10
作者
BOHRINGER, K [1 ]
LIU, XH [1 ]
KALBITZER, S [1 ]
机构
[1] SHANGHAI INST MET, SHANGHAI, PEOPLES R CHINA
来源
JOURNAL OF PHYSICS C-SOLID STATE PHYSICS | 1983年 / 16卷 / 33期
关键词
D O I
10.1088/0022-3719/16/33/004
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
引用
收藏
页码:L187 / L192
页数:6
相关论文
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