FLOW PHENOMENA IN CHEMICAL VAPOR-DEPOSITION OF THIN-FILMS

被引：62

作者：

JENSEN, KF ^{[1
]}

EINSET, EO ^{[1
]}

FOTIADIS, DI ^{[1
]}

机构：

[1] UNIV MINNESOTA, DEPT CHEM ENGN & MAT SCI, MINNEAPOLIS, MN 55455 USA

来源：

ANNUAL REVIEW OF FLUID MECHANICS | 1991年 / 23卷

关键词：

MIXED CONVECTION; DOUBLE-DIFFUSIVE PHENOMENA; THERMAL AND SOLUTAL CONVECTION; FINITE-ELEMENT FLOW SIMULATIONS; MATERIALS PROCESSING; HORIZONTAL MOCVD REACTORS; MONTE-CARLO SIMULATION; GROWTH-RATE UNIFORMITY; ROTATING-DISK; TRANSPORT PHENOMENA; MASS-TRANSFER; GAS-PHASE; DIRECTIONAL SOLIDIFICATION; THERMAL-CONVECTION; MATHEMATICAL-MODEL;

D O I：

10.1146/annurev.fluid.23.1.197

中图分类号：

O3 [力学];

学科分类号：

08 ; 0801 ;

摘要：

引用

页码：197 / 232

页数：36

共 99 条

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