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PRESERVATION OF INDIUM-PHOSPHIDE SUBSTRATES - THE IN-SN-P MELT REVISITED
被引:12
作者:
CHIN, BH
SCHWARTZ, GP
DAUTREMONTSMITH, WC
DICK, JR
机构:
[1] AT&T Bell Lab, Murray Hill, NJ,, USA, AT&T Bell Lab, Murray Hill, NJ, USA
关键词:
MASS SPECTROMETERS - Applications - SEMICONDUCTOR MATERIALS - Substrates - SPECTROSCOPY;
AUGER ELECTRON - Applications - TIN AND ALLOYS - Measurements;
D O I:
10.1149/1.2108361
中图分类号:
O646 [电化学、电解、磁化学];
学科分类号:
081704 ;
摘要:
Using Auger electron spectroscopy and secondary ion mass spectrometry, we have detected very high levels of tin (approximately 10**2**1/cm**3) on (100) InP substrates preserved at high temperatures (650 degree -700 degree C) with phosphorus vapor supplied by an In-Sn-P solution. Depth profiling through InP epilayers grown on preserved substrates, however, indicates no tin buildup at the epilayer/substrate interface. Surface studies and depth profiling of control samples reveal that the tin accumulated during preservation is restricted to the near-surface region (approximately less than 10 Angstrom) and readily dissolves into an In-P melt.
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页码:2161 / 2164
页数:4
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