DIFFRACTION EFFICIENCY AND DECAY TIMES OF FREE-CARRIER GRATINGS IN SILICON

被引:46
作者
EICHLER, HJ
MASSMANN, F
机构
关键词
D O I
10.1063/1.331025
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:3237 / 3242
页数:6
相关论文
共 18 条
[1]   AUGER COEFFICIENTS FOR HIGHLY DOPED AND HIGHLY EXCITED SILICON [J].
DZIEWIOR, J ;
SCHMID, W .
APPLIED PHYSICS LETTERS, 1977, 31 (05) :346-348
[2]  
EICHLER HJ, UNPUB DISTORTION ND
[3]  
EICHLER HJ, 1978, ADV SOLID STATE PHYS, V18, P241
[4]   QUANTUM YIELD OF SILICON IN THE VISIBLE [J].
GEIST, J ;
ZALEWSKI, EF .
APPLIED PHYSICS LETTERS, 1979, 35 (07) :503-506
[5]  
HERBST RL, 1977, OPT COMMUN, V5, P15
[6]   STUDY OF SURFACE RECOMBINATION IN GAAS AND INP BY PICOSECOND OPTICAL TECHNIQUES [J].
HOFFMAN, CA ;
GERRITSEN, HJ ;
NURMIKKO, AV .
JOURNAL OF APPLIED PHYSICS, 1980, 51 (03) :1603-1604
[7]  
HOFFMANN CA, 1980, APPL PHYS LETT, V33, P536
[8]  
JAIN RK, 1979, APPL PHYS LETT, V35, P6
[9]   AMBIPOLAR DIFFUSION MEASUREMENTS IN SEMICONDUCTORS USING NON-LINEAR TRANSIENT GRATINGS [J].
JARASIUNAS, K ;
GERRITSEN, HJ .
APPLIED PHYSICS LETTERS, 1978, 33 (02) :190-193
[10]   INVESTIGATION OF NONEQUILIBRIUM PROCESSES IN SEMICONDUCTORS BY METHOD OF TRANSIENT HOLOGRAMS [J].
JARASIUNAS, K ;
VAITKUS, J .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1977, 44 (02) :793-800