TA/SIN-STRUCTURE X-RAY MASKS FOR SUB-HALF-MICRON LSIS

被引：21

作者：

OHKI, S

KAKUCHI, M

MATSUDA, T

OZAWA, A

OHKUBO, T

ODA, M

YOSHIHARA, H

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1989年 / 28卷 / 10期

关键词：

D O I：

10.1143/JJAP.28.2074

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2074 / 2079

页数：6

共 15 条

[11] THE IMPACT OF HIGH-SENSITIVITY RESIST MATERIALS ON X-RAY-LITHOGRAPHY [J].

SELIGSON, D ;

ITO, H ;

WILLSON, CG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :2268-2273

[12] FABRICATION OF FULLY SCALED 0.5-MU-M N-TYPE METAL-OXIDE SEMICONDUCTOR TEST DEVICES USING SYNCHROTRON X-RAY-LITHOGRAPHY - OVERLAY, RESIST PROCESSES, AND DEVICE FABRICATION [J].

SILVERMAN, JP ;

DIMILIA, V ;

KATCOFF, D ;

KWIETNIAK, K ;

SEEGER, D ;

WANG, LK ;

WARLAUMONT, JM ;

WILSON, AD ;

CROCKATT, D ;

DEVENUTO, R ;

HILL, B ;

HSIA, LC ;

RIPPSTEIN, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :2147-2152

[13] FULLY SCALED 0.5 MU-M METAL-OXIDE SEMICONDUCTOR CIRCUITS BY SYNCHROTRON X-RAY-LITHOGRAPHY - MASK FABRICATION AND CHARACTERIZATION [J].

VISWANATHAN, R ;

ACOSTA, RE ;

SEEGER, D ;

VOELKER, H ;

WILSON, A ;

BABICH, I ;

MALDONADO, J ;

WARLAUMONT, J ;

VLADIMIRSKY, O ;

HOHN, F ;

CROCKATT, D ;

FAIR, R .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :2196-2201

[14]

WINDBRACKE W, 1984, 33RD EIPB, pG2

[15]

YOSHIOKA N, 1989, SPIE P, V1089, P215

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