CHARACTERIZATION OF TA2O5 LAYERS BY ELECTRON-SPECTROSCOPY FOR CHEMICAL-ANALYSIS RUTHERFORD BACKSCATTERING SPECTROMETRY, NUCLEAR-REACTION ANALYSIS AND OPTICAL METHODS

被引：36

作者：

GURTLER, K

BANGE, K

WAGNER, W

RAUCH, F

HANTSCHE, H

机构：

[1] SCHOTT GLASSWERKE,HATTENBERGSTR 10,D-6500 MAINZ,FED REP GER

[2] UNIV FRANKFURT,INST KERNPHYS,D-6000 FRANKFURT,FED REP GER

[3] BUNDESANSTALT MAT PRUFUNG & FORSCH,D-1000 BERLIN 45,FED REP GER

来源：

THIN SOLID FILMS | 1989年 / 175卷 / 1 -2 pt 2期

关键词：

Light--Refraction - Optical Properties;

D O I：

10.1016/0040-6090(89)90826-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ta2O5 layers were deposited by reactive evaporation (RE) and reactive low-voltage ion plating (IP). The layers were characterized by thin film analysis and optical methods. The deposition techniques have a strong influence on the film density, the refractive index and on the hydrogen content, which was determined by the 15N technique. Differences in the stoichiometry are observed which can be correlated with the deposition conditions.

引用

页码：185 / 189

页数：5

共 12 条

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