ON THE STRUCTURAL MODEL OF CVD A-SI-O-H FILMS

被引：3

作者：

OTS, K

SEILENTHAL, M

机构：

来源：

PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1984年 / 83卷 / 02期

关键词：

D O I：

10.1002/pssa.2210830244

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

10

引用

收藏

页码：K109 / K111

页数：3

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