ENHANCEMENT OF GROWTH-RATE DUE TO TIN DOPING IN GAAS EPILAYER GROWN BY LOW-PRESSURE METAL-ORGANIC CHEMICAL VAPOR-DEPOSITION

被引:8
作者
CHANG, CY
LEE, MK
SU, YK
HSU, WC
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D O I
10.1063/1.332690
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O59 [应用物理学];
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页码:5464 / 5465
页数:2
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