THERMODYNAMIC AND KINETIC CONSIDERATIONS ON THE EQUILIBRIUM SHAPE FOR THERMALLY INDUCED MICRODEFECTS IN CZOCHRALSKI SILICON

被引：102

作者：

TILLER, WA

HAHN, S

PONCE, FA

机构：

[1] XEROX CORP,PALO ALTO RES CTR,PALO ALTO,CA 94304

[2] SILTEC CORP,MT VIEW,CA 94043

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 59卷 / 09期

关键词：

D O I：

10.1063/1.336908

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3255 / 3266

页数：12

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