REVIEW OF INFRARED SPECTROSCOPIC STUDIES OF VAPOR-DEPOSITED DIELECTRIC GLASS-FILMS ON SILICON

被引：75

作者：

WONG, J ^{[1
]}

机构：

[1] GE,SCHENECTADY,NY 12301

来源：

JOURNAL OF ELECTRONIC MATERIALS | 1976年 / 5卷 / 02期

关键词：

D O I：

10.1007/BF02652900

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：113 / 160

页数：48

共 133 条

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